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GRM201 PMSM 200 M³/H Dry Running Vacuum Pump ISO63 KF25

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GRM201 PMSM 200 M³/H Dry Running Vacuum Pump ISO63 KF25

Delivery Time : 15-30 working days

Pumping Speed : 200 m³/h

Gas Compatibility : Flammable, explosive, and condensable process gases

Model Number : GRM201

Payment Terms : T/T, L/C, Western Union

Cooling Water Flow : ≥3 L/min

Outlet Connection : KF25

Place of Origin : China

Dimensions (L×W×H) : 741×344×466 mm

Cooling Water Temperature : 5-30 °C

Noise Level : ≤63 dB(A)

Control Interface : I/O and RS485 (Modbus Protocol)

Voltage : 380V Three-Phase

Weight : 150 kg

Rated Power : 1.9 kW

N2 Purge Flow : 12-50 L/min

Sealing System : Lip Seal + Labyrinth Seal with N2 Purge

Brand Name : GRM

MOQ : 1 Set

Price : USD 5,000-8,000 / Set

Supply Ability : 300 Sets per Month

Motor Type : Permanent Magnet Synchronous Motor (PMSM)

Packaging Details : Export-grade plywood case with vacuum-sealed moisture barrier and shock-proof foam insert

Inlet Connection : ISO63

Certification : ISO 9001:2015, ISO 14001:2015, ISO 45001:2018

Ultimate Pressure : ≤0.5 Pa

Pump Type : Dry Vacuum Pump

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GRM201 Dry Vacuum Pump

The GRM201 is a 200 m³/h dry vacuum pump delivering low power consumption and high pumping speed. It safely handles flammable, explosive, and condensable process gases, making it suitable for PECVD, MOCVD, and SIC-CVD semiconductor processes with high reliability and low maintenance costs.

Key Features

Permanent Magnet Synchronous Motor — Delivers superior energy efficiency with industry-leading low power consumption.
Advanced Rotor Structure — Enhanced dust extraction capability ensures reliable operation in particulate-heavy process environments.
Dust and Water Vapor Tolerant — Insensitive to dust and water vapor entrained in the pumped gas stream.
Compact and Integrated Design — Small footprint with high system integration for easy installation in crowded fab environments.
Comprehensive Protection — Built-in protection functions with strong adaptive capability for varying process conditions.
Low Vibration and Noise — Operates at ≤63 dB(A) at ultimate pressure for a quieter workplace.
Advanced Sealing System — Lip seal and labyrinth seal combined with nitrogen purge effectively prevents oil back-streaming, maintaining high vacuum cleanliness in the process chamber.
Remote Control and Monitoring — Supports I/O interface and RS485 communication (Modbus protocol) for seamless integration into factory automation systems.
Hazardous Gas Compatible — Safe operation with flammable, explosive, and condensable process gases.

Technical Specifications

Parameter	Specification
Pumping Speed	200 m³/h
Ultimate Pressure	≤0.5 Pa
Rated Power	1.9 kW
Voltage	380V Three-Phase
Cooling Water Pressure	0.2-0.6 MPa
Cooling Water Flow	≥3 L/min
Cooling Water Temperature	5-30 °C
Cooling Water Connection	G3/8
N2 Purge Pressure	0.2-0.6 MPa
N2 Purge Flow	12-50 L/min
N2 Purge Connection	G1/4
Inlet Connection	ISO63
Outlet Connection	KF25
Noise Level	≤63 dB(A)
Operating Environment	5~40°C; ≤80% RH
Weight	150 kg
Dimensions (LWH)	741344466 mm

Application Processes

Clean Processes

Load-Lock, Transfer, Metrology, Lithography

Medium Processes

PVD Process, PVD Pre-Clean, RTA, Strip/Ashing, Oxide Etch, Silicon Etch, Implant Source, Metal Etch

Harsh Processes

HDP-CVD, RTP, SACVD, MOCVD, PECVD, LPCVD, ALD

Target Industries

Semiconductor: Etching, ion implantation, CVD, PECVD, MOCVD, and SIC-CVD clean/medium/harsh process applications.
Photovoltaic: Crystal growth furnaces, cell manufacturing processes.
Lithium Battery: Cell vacuum drying, electrolyte filling, and degassing processes.
Flat Panel Display & LED: Manufacturing processes requiring high-cleanliness vacuum environments.

Product Tags:

PMSM dry vacuum pump

200 m³/h dry vacuum pump

ISO63 KF25 dry vacuum pump

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